Atomic force microscopy study of photoreversible nanoscale surface relief grating patterns on side chain dendritic polyester thin films

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 360, Issue 1-3, 2010, Pages 167-174

  Galgano, Joshua J ^a   Karunatilaka, Chandana ^b   Rethwisch, David G ^a   Tivanski, Alexei V ^b  

^a UNIVERSITY OF IOWA   (United States)

^b E11 SSH   (United States)

Author keywords

AFM; Azobenzene; Dendrimers; Photoeffectiveness; Surface relief gratings

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; AZOBENZENE; DENDRIMERS; FILM THICKNESS; HIGH ENERGY LASERS; ISOMERIZATION; NANOSTRUCTURED MATERIALS; OXIDE MINERALS; PLASTIC FILMS; POLYMERIC FILMS; QUARTZ; SYNTHESIS (CHEMICAL); THIN FILMS; TOPOGRAPHY; ULTRAVIOLET LASERS; ULTRAVIOLET SPECTROSCOPY;

AFM; AFM IMAGE; AZOBENZENE MOIETY; CIS-TRANS ISOMERIZATION; COST EFFECTIVE; DENDRIMER GENERATION; DENDRITIC WEDGES; HIGH RESOLUTION; HOMOGENEOUS THIN FILM; LOW MOLECULAR WEIGHT; NANO-GRATINGS; NANO-SCALE SURFACES; OPTICAL APPLICATIONS; PHOTORESPONSIVE BEHAVIOR; POLYMER SAMPLES; POLYMER THIN FILMS; QUARTZ SLIDES; SIDE CHAINS; SURFACE RELIEF GRATINGS; THIRD GENERATION; UV LIGHT; UV SPECTROSCOPY; UV- AND; VISIBLE LIGHT;

POLYMER FILMS;

AZOBENZENE; CHLORIDE; DENDRIMER; NANOFILM; NANOMATERIAL; POLYESTER; POLYMER; SIDE CHAIN DENDRITIC POLYESTER; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; CIS TRANS ISOMERISM; CONFORMATIONAL TRANSITION; CONTROLLED STUDY; COST EFFECTIVENESS ANALYSIS; FILM COATING; GRATING; HEAT TREATMENT; LIGHT EXPOSURE; MOLECULAR WEIGHT; NANOFABRICATION; NANOIMAGING; OPTICAL TOMOGRAPHY; PHASE SEPARATION; POLYMERIZATION; PRIORITY JOURNAL; PROCESS OPTIMIZATION; STOICHIOMETRY; SURFACE PROPERTY; ULTRAVIOLET IRRADIATION; ULTRAVIOLET SPECTROSCOPY;

EID: 77951979203     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2010.02.034     Document Type: Article

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