Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7580, Issue , 2010, Pages

  Imai, Shinichi ^a   Matsuki, Kazuto ^a   Kikuiri, Nobutaka ^a   Takayama, Katsuhiko ^b   Iwase, Osamu ^b   Urata, Yoshiharu ^c   Shinozaki, Tatsuya ^c   Wada, Yoshio ^c   Wada, Satoshi ^c  

^a Advanced Mask Inspection Technology Inc   (Japan)

^b NUFLARE TECHNOLOGY INC   (Japan)

^c RIKEN   (Japan)

Author keywords

Fiber amplifier; Inspection; Lasers; Photomask; Pulsed lasers; Ultraviolet lasers

Indexed keywords

1064 NM; CW LIGHT; ER-DOPED FIBER LASER; INSPECTION MACHINES; LEADING EDGE; MASK INSPECTION; MULTI-WAVELENGTH CONVERSION; PULSED OPERATION; SEMICONDUCTOR APPLICATIONS; SEMICONDUCTOR INSPECTION; WAVELENGTH CONVERSION; YB DOPED FIBER LASER;

ERBIUM; FIBER AMPLIFIERS; FIBERS; INSPECTION; LIGHT SOURCES; MAINTENANCE; OPTICAL FREQUENCY CONVERSION; PULSED LASERS; SEMICONDUCTOR LASERS; YTTERBIUM;

ULTRAVIOLET LASERS;

EID: 77951910856     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.840467     Document Type: Conference Paper

References (9)

1. Kikuiri, N., Murakami, S., Tsuchiya, H., Tateno, M., Takahara, K., Imai, S., Hirano, R., Isomura, I., Tsuji, Y., Tamura, Y., Matsumura, K., Usuda, K., Otaki, M., Suga, O., Ohira, K., "Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond", Proc. SPIE, Vol. 6283, 62830Y (2006). (Pubitemid 44300621)
2. Imai, S., Inoue, H., Nomura T., Tojo T., "CW 198.5-nm light generation in CLBO" OSA TOPS Vol.83, 380-383 (2004).
3. Urata, Y., Shinozaki, T., Wada, Y., Kaneda, Y., Wada, S., Imai, S., "Deep UV light generation by a fiber/bulk hybrid amplifier at 199 nm", Applied Opt., Vol.48, 1668-1674 (2009).
4. Wada, Y., Shinozaki, T. , Urata, Y., Kaneda, Y., Wada, S. Imai, S., "Polarization-maintaining 1064 nm fiber MOPA system with narrow bandwidth for wavelength conversion", Advanced Solid-state Photonics, Technical Digest, paper MB15(2007)
5. http://www.jst.go.jp/kisoken/crest/report/heisei20/pdf/pdf09/09-003.pdf , in Japanese
6. http://www.jst.go.jp/kisoken/crest/en/area04/2-04.html
7. Nishioka, M., Kanoh, A., Yoshimura, M., Mori, Y., Sasaki, T., Katsura, T., Kojima, T., Nishimae, J., Jpn. J. Appl. Phys., Vol.44, L699-L700 (2005)
8. Kawamura, T., Yoshimura, M., Honda, Y., Nishioka, M., Shimizu, Y., Kitaoka, Y., Mori, Y., Sasaki, T., Appl. Opt. Vol.48, 1658-1662 (2009)
9. Takahara, K., Tsuchiya, H., Nagai, H., Hashimoto, H., Isobe, M., Usuda, K., Kikuiri, N., Tsuji, Y., Imai, S., Isomura, I., Yamashita, K., Tamura, Y., Hirano, R., "Newly - developed function of NPI series, mask inspection system", SPIE 7379-7478, 57-58 (2009).