Prevalence of plasmid-mediated quinolone-resistance determinants in Shigella flexneri isolates from Anhui Province, China

Journal of Antibiotics

Volumn 63, Issue 4, 2010, Pages 187-189

  Xiong, Zizhong ^a   Li, Jun ^a   Li, Tao ^a   Shen, Jilu ^a   Hu, Fupin ^b   Wang, Minggui ^b  

^a ANHUI MEDICAL UNIVERSITY   (China)

^b FUDAN UNIVERSITY   (China)

Author keywords

Plasmid; Quinolone resistance; Shigella flexneri

Indexed keywords

CEFOTAXIME; CIPROFLOXACIN; NALIDIXIC ACID; QUINOLINE DERIVED ANTIINFECTIVE AGENT;

ANTIBIOTIC RESISTANCE; ARTICLE; BACTERIAL GENE; BACTERIUM ISOLATE; CHINA; CLONE; CONTROLLED STUDY; GENE MUTATION; GENE SEQUENCE; NONHUMAN; PLASMID; POLYMERASE CHAIN REACTION; PREVALENCE; PRIORITY JOURNAL; SHIGELLA FLEXNERI;

ANTI-BACTERIAL AGENTS; BASE SEQUENCE; CHINA; DNA GYRASE; DNA TOPOISOMERASES, TYPE I; DRUG RESISTANCE, BACTERIAL; DYSENTERY, BACILLARY; HUMANS; MICROBIAL SENSITIVITY TESTS; MOLECULAR SEQUENCE DATA; PLASMIDS; PREVALENCE; QUINOLONES; SHIGELLA FLEXNERI;

SHIGELLA FLEXNERI;

EID: 77951744229     PISSN: 00218820     EISSN: None     Source Type: Journal    
DOI: 10.1038/ja.2010.16     Document Type: Article

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