Growth and characterization of Er doped ZnO prepared by reactive ion beam sputtering

INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

Volumn , Issue , 2010, Pages 976-977

  Liau, Chung Chi ^a   Chao, Liang Chiun ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CORE LEVELS; ER-DOPED; ERBIUM OXIDE; GROWTH DIRECTIONS; PARTIAL FLOW RATE; REACTIVE ION BEAM SPUTTERING; SI SUBSTRATES; XPS ANALYSIS;

ION BEAMS; ION SOURCES; IONS; NANOELECTRONICS; OXYGEN; SPUTTERING; ZINC OXIDE;

ERBIUM;

EID: 77951663268     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/INEC.2010.5425089     Document Type: Conference Paper

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