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Volumn , Issue , 2009, Pages 000744-000747

Highly-transparent ZnO:Ga through rapid thermal annealing for low-bandgap solar cell application

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER LAYERS; ART CONVERSION; BAND GAPS; ELEVATED TEMPERATURE; FILL FACTOR; FILM CONDUCTIVITY; GA-DOPED ZNO; LIGHT-TRAPPING; MICROCRYSTALLINE SI; OPTICAL TRANSMISSIONS; ROOM TEMPERATURE; SINGLE JUNCTION SOLAR CELLS; SOLAR-CELL APPLICATIONS; SPECTRAL RESPONSE; ZNO;

EID: 77951619060     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2009.5411175     Document Type: Conference Paper
Times cited : (4)

References (9)
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  • 5
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    • (2006) Appl. Phys. Lett. , vol.88 , pp. 071909
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  • 7
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    • Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering
    • F.-J. Haug, Zs. Geller, H. Zogg, A. N. Tiwari, and C. Vignali, "Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering", J. Vac. Sci. Technol. A. Vac. Surf. Films. 19, 2001, pp. 171-174
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.