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Volumn , Issue , 2009, Pages 000642-000645
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Effect of texture morphology on the surface passivation and a-Si/c-Si heterojunction solar cells
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Author keywords
[No Author keywords available]
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Indexed keywords
A-SI LAYERS;
A-SI:H;
CVD METHOD;
DIFFERENT HEIGHTS;
EFFECTIVE ABSORPTION;
ELECTRICAL CHARACTERISTIC;
ETCHING TIME;
FILL FACTOR;
HETEROJUNCTION SOLAR CELLS;
KEY PARAMETERS;
MINORITY CARRIER;
SI SUBSTRATES;
SI SURFACES;
SI WAFER;
SURFACE PASSIVATION;
SURFACE REFLECTANCE;
SURFACE-TEXTURING;
CHEMICAL VAPOR DEPOSITION;
ETCHING;
HETEROJUNCTIONS;
LIGHT;
MORPHOLOGY;
OPEN CIRCUIT VOLTAGE;
PASSIVATION;
REFLECTION;
SILICON;
SILICON WAFERS;
SOLAR CELLS;
SUBSTRATES;
SURFACE MORPHOLOGY;
SWITCHING CIRCUITS;
VOLATILE ORGANIC COMPOUNDS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 77951612567
PISSN: 01608371
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/PVSC.2009.5411603 Document Type: Conference Paper |
Times cited : (8)
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References (7)
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