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Volumn , Issue , 2009, Pages 000642-000645

Effect of texture morphology on the surface passivation and a-Si/c-Si heterojunction solar cells

Author keywords

[No Author keywords available]

Indexed keywords

A-SI LAYERS; A-SI:H; CVD METHOD; DIFFERENT HEIGHTS; EFFECTIVE ABSORPTION; ELECTRICAL CHARACTERISTIC; ETCHING TIME; FILL FACTOR; HETEROJUNCTION SOLAR CELLS; KEY PARAMETERS; MINORITY CARRIER; SI SUBSTRATES; SI SURFACES; SI WAFER; SURFACE PASSIVATION; SURFACE REFLECTANCE; SURFACE-TEXTURING;

EID: 77951612567     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2009.5411603     Document Type: Conference Paper
Times cited : (8)

References (7)
  • 6
    • 0033075017 scopus 로고    scopus 로고
    • Improved anisotropic etching processfor industrial texturing of silicon solar cell
    • Vazsonyi E, et al., Improved anisotropic etching processfor industrial texturing of silicon solar cell, Solar Energy Materials & Solar Cell 1999, 57, 179-88
    • (1999) Solar Energy Materials & Solar Cell , vol.57 , pp. 179-188
    • Vazsonyi, E.1
  • 7
    • 0030388867 scopus 로고    scopus 로고
    • 17.1 % Efficient truncated-pyramid inversion-layer silicon solar cells
    • Manfred Grauvogl et al., "17.1 % Efficient truncated-pyramid inversion-layer silicon solar cells" 25th PVSC, 1996, p. 433-436
    • 25th PVSC, 1996 , pp. 433-436
    • Grauvogl, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.