Fabrication of silicon nanopillar-based nanocapacitor arrays

Applied Physics Letters

Volumn 96, Issue 15, 2010, Pages

  Chang, Shih Wei ^a   Oh, Jihun ^a   Boles, Steven T ^a   Thompson, Carl V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE DENSITY; ELECTRODE AREAS; ELECTROPLATED NI; HIGH ASPECT RATIO; NANOCAPACITORS; NANOPILLAR; NANOPILLARS; SILICON TECHNOLOGIES;

ASPECT RATIO; CAPACITANCE; CAPACITANCE MEASUREMENT; ETCHING;

FABRICATION;

EID: 77951600307     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3374889     Document Type: Article

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