Characterizing antireflection coatings on textured mono-crystalline silicon with spectroscopic ellipsometry

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2009, Pages 001407-001411

  Sun, Jianing ^a   Saenger, Mario F ^b   Schubert, Mathias ^b   Hilfiker, James N ^a   Synowicki, Ron ^a   Herzinger, Craig M ^a   Woollam, J A ^a,b  

^a J A WOOLLAM CO INC   (United States)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION FILMS; AR COATINGS; CRYSTALLINE SILICONS; DEVICE EFFICIENCY; EFFECTIVE SUPPRESSION; EFFECTIVE-MEDIUM APPROXIMATION; INCIDENT ANGLES; LATERAL MEASUREMENTS; LIGHT-TRAPPING; MEASUREMENT GEOMETRY; MODELING APPROACH; MODELING METHODOLOGY; MONOCRYSTALLINE SILICON; OPTICAL CHARACTERIZATION; PHOTOVOLTAIC APPLICATIONS; REFLECTED LIGHT; ROTATIONAL ANGLE; SAMPLE SURFACE; TEXTURED SURFACE;

ANTIREFLECTION COATINGS; COATINGS; CRYSTALLINE MATERIALS; GEOMETRY; LIGHT REFLECTION; MEASUREMENTS; OPTICAL PROPERTIES; SILICON NITRIDE; SPECTROSCOPIC ELLIPSOMETRY;

OPTICAL FILMS;

EID: 77951588483     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2009.5411301     Document Type: Conference Paper

References (6)

1. E. Ryabova, "A Review of Solar Wafer Cleaning and Texturing Methods," Photovoltaics International, 1, 2, (2009) 12-15.
2. Hiroyuki Fujiwara, Spectroscopic Ellipsometry: Principles and Applications, John Wiley & Sons, (2007).
3. H. G. Tompkins, and W. A. McGahan, Spectroscopic Ellipsometry and Reflectometry, John Wiley & Sons, New York, (1999).
4. H. G. Tompkins and E. A. Irene, eds., Handbook of Ellipsometry, William Andrew Publishing, NY, (2005).
5. M. F. Saenger, et al. "Spectroscopic ellipsometry characterization of SiNx antireflection films on textured multicrystalline and monocrystalline silicon solar cells", Thin Solid Films, (2009).
6. D. E. Aspnes, J. B. Theeten, and F. Hottier, "Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometry", Phys. Rev. B 20 8 (1979) 3292.