Hot-melt inkjet as masking technology for back-contacted cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2009, Pages 001064-001068

  Mingirulli, Nicola ^a   Keding, Roman ^a   Specht, Jan ^a   Fallisch, Arne ^a   Stüwe, David ^a   Biro, Daniel ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EMITTER LAYERS; ETCHING PROCESS; GRID-BASED; HOT MELT; LIFT-OFF PROCESS; MASKING TECHNOLOGY; METAL ETCHING; METAL LAYER; METALLIZATIONS; OPENING WIDTH; PRINTED IMAGES; PROCESS DEVELOPMENT; SHUNT RESISTANCES; TEST STRUCTURE; THIN METAL LAYERS;

CONTACT RESISTANCE; ETCHING; METALS; SILICON SOLAR CELLS;

SMELTING;

EID: 77951527488     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2009.5411204     Document Type: Conference Paper

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