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Volumn 41, Issue 2, 2010, Pages 295-302

Communication: Three-layer electrorefining of silicon

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL ENERGY; ELECTROLYTE LAYERS; ELECTROREFINING; FLUORIDE ELECTROLYTE; HIGH-MELTING; HIGH-PURITY; INDUSTRIAL REACTORS; IRREVERSIBLE THERMODYNAMICS; LABORATORY SCALE; MANUFACTURING PROCESS; METAL ALLOYS; MOLTEN LAYERS; MULTICRYSTALLINE SI; NOVEL METHODS; SI-BASED; STABLE OPERATION; THREE-LAYER; VERTICAL STACKS;

EID: 77951297926     PISSN: 10735615     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11663-010-9362-8     Document Type: Article
Times cited : (27)

References (19)
  • 2
    • 77951299046 scopus 로고
    • Patent US 1 534 318
    • W. Hoopes: Patent US 1 534 318, 1922.
    • (1922)
    • Hoopes, W.1
  • 3
    • 77951295045 scopus 로고
    • Patent US 2 034 339
    • R.A. Gadeau: Patent US 2 034 339, 1933.
    • (1933)
    • Gadeau, R.A.1
  • 16
    • 77951296721 scopus 로고    scopus 로고
    • Patent Norway
    • E. Olsen: Patent Norway, 2010, vol.328, p. 263.
    • (2010) , vol.328 , pp. 263
    • Olsen, E.1
  • 17
    • 0003798188 scopus 로고    scopus 로고
    • version 6.12, Outotec Research, Oy, Finland
    • A. Roine, HSC Chemistry for Windows, version 6.12, Outotec Research, Oy, Finland, 2007.
    • (2007) HSC Chemistry for Windows
    • Roine, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.