Basic characteristics for PEN film surface modification using atmospheric-pressure nonequilibrium microwave plasma jet

Electronics and Communications in Japan

Volumn 93, Issue 5, 2010, Pages 42-49

  Yuji, Toshifumi ^a   Urayama, Takuya ^b   Fujii, Shuitsu ^b   Iijima, Yoshitoki ^c   Suzaki, Yoshifumi ^d   Akatsuka, Hiroshi ^e  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b ADTEC Plasma Technology Co Ltd   (Japan)

^c JEOL LTD   (Japan)

^d KAGAWA UNIVERSITY   (Japan)

^e TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Contact angle; Microwave plasma jet; Polyethylene naphthalate film; Rotational temperature; Surface modification

Indexed keywords

MICROWAVE PLASMA JET; POLYETHYLENE NAPHTHALATE; POLYETHYLENE NAPHTHALATE FILM; ROTATIONAL TEMPERATURE; SURFACE MODIFICATION;

ATMOSPHERIC TEMPERATURE; CONTACT ANGLE; HYDROPHILICITY; MICROWAVES; PLASMA ACCELERATORS; PLASMA JETS; PLASMA THEORY; POLYETHYLENES; THERMOPLASTICS;

ELECTRIC DISCHARGES;

EID: 77951234522     PISSN: 19429533     EISSN: 19429541     Source Type: Journal    
DOI: 10.1002/ecj.10207     Document Type: Article

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