Electrochemical behavior of gold colloidal alkyl modified silicon surfaces

ACS Applied Materials and Interfaces

Volumn 1, Issue 11, 2009, Pages 2477-2483

  Le Saux, Guillaume ^a   Ciampi, Simone ^a   Gaus, Katharina ^a   Gooding, J Justin ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

blocking effect; gold nanoparticles; hydrosilylation; mixed self assembled monolayers; silicon surfaces

Indexed keywords

ACID RATIO; BLOCKING EFFECT; COLLOIDAL GOLD; ELECTROCHEMICAL BEHAVIORS; ELECTRON TRANSFER; GOLD NANOPARTICLES; MIXED SELF ASSEMBLED MONOLAYERS; NANOELECTRODE ARRAY; SILICON SURFACES; TETHERED NANOPARTICLES; UNDECYLENIC ACID;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; GOLD; HYDROSILYLATION; NANOPARTICLES; X RAY PHOTOELECTRON SPECTROSCOPY;

SELF ASSEMBLED MONOLAYERS;

GOLD; NANOPARTICLE; SILICON; TRIFLUOROACETIC ACID;

ARTICLE; CHEMISTRY; COLLOID; ELECTROCHEMICAL ANALYSIS; ELECTRODE; IMPEDANCE; SURFACE PROPERTY; ULTRASTRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

COLLOIDS; ELECTRIC IMPEDANCE; ELECTROCHEMICAL TECHNIQUES; ELECTRODES; GOLD; NANOPARTICLES; PHOTOELECTRON SPECTROSCOPY; SILICON; SURFACE PROPERTIES; TRIFLUOROACETIC ACID;

EID: 77951211124     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am900427w     Document Type: Article

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