Chemical solution deposited PbS thin films on Si(100)

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 11, 2008, Pages 3431-3436

  Osherov, Anna ^a   Golan, Yuval ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SOLUTIONS; DEPOSITION TEMPERATURES; REAGENT CONCENTRATION; SI (100) SUBSTRATE; SI(1 0 0);

CHEMICALS; DEPOSITION; GROWTH (MATERIALS); NANOSTRUCTURES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SYNTHESIS (CHEMICAL);

EID: 77951148969     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200879445     Document Type: Conference Paper

References (17)

1. M. Shandalov and Y. Golan, Eur. Phys. J. Appl. Phys. 24, 13 (2003).
2. M. Shandalov and Y. Golan, Eur. Phys. J. Appl. Phys. 28, 51 (2004).
3. M. Shandalov and Y. Golan, Eur. Phys. J. Appl. Phys. 31, 27 (2005).
4. M. Shandalov and Y. Golan, Chem. Mater. 18, 3593 (2006).
5. A. Osherov, M. Shandalov, V. Ezersky, and Y. Golan, J. Cryst. Growth 304, 169 (2007).
6. A. Osherov, V. Ezersky, and Y. Golan, Eur. Phys. J. Appl. Phys. 37, 39-47 (2007).
7. A. Osherov, V. Ezersky, and Y. Golan, J. Cryst. Growth 308, 334 (2007).
8. J. Puisco, S. Tamulevicius, G. Laukaitis, S. Lindroos, M. Leskala, and V. Snitka, Thin Solid Films 403/404, 457 (2002).
9. H. Elabd and A.J. Steckl, J. Appl. Phys. 51, 726 (1980)
10. H. Elabd, A.J. Steckl, and W. Vidinski, Sol. Cells 1, 199 (1980).
11. R.K. Joshi, A. Kanjilal, and H.K. Sehgal, Appl. Surf. Sci. 221, 43 (2004).
12. Y.S. Sarma, H.N. Acharya, and N.K. Misra, J. Mater. Sci. 21, 137 (1986) and references cited therein.
13. V.I. Levchenco, L.I. Postnova, V.P. Bondarenko, N.N. Vorozov, V.A. Yakovtseva, and L.N. Dolgyi, Thin Solid Films 348, 141 (1999).
14. K.D. Dobson, G. Hodes, and Y. Mastai, Sol. Energy Mater. Sol. Cells 80, 283 (2003).
15. H. Rahnamai, H.J. Gray, and J.N. Zemel, Thin Solid Films 69, 347 (1980).
16. M. Isshiki, T. Endo, and K. Masumoto, J. Electrochem. Soc. 137, 2697 (1990).
17. G. Hodes, Chemical Solution Deposition of Semiconductor Films (Marcel Dekker, Inc., New York-Basel, 2002).