Analysis of impedance matching control

2009 IEEE 6th International Power Electronics and Motion Control Conference, IPEMC '09

Volumn , Issue , 2009, Pages 1188-1191

  Hirose, Yuuki ^a   Kawamura, Atsuo ^b   Takayanagi, Atsushi ^c   Takada, Hirokazu ^c  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b Kyosan Electric Manufacturing Co Ltd

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL METHODS; EQUIVALENT LOAD; IMPEDANCE MATCHING CONTROL; IMPEDANCE MATCHINGS; LC CIRCUITS; PLASMA CHAMBERS; PLASMA PROCESSING; STABILITY OPERATIONS;

CAPACITANCE; IMPEDANCE MATCHING (ELECTRIC); MOTION CONTROL; MOTION PLANNING; MULTIVARIABLE SYSTEMS; POWER ELECTRONICS;

PLASMA STABILITY;

EID: 77951141512     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IPEMC.2009.5157563     Document Type: Conference Paper

References (4)

1. I. Yuzurihara, A. Takayanagi, "Analysis of matching control", Kyosan Journal, 2005
2. I. Yuzurihara , A. Takayanagi, "About the RF systems and matching box", Kyosan Journal, 2005
3. I. Yuzurihara , A. Takayanagi, "Principle of operation of matching sensor circuit", Kyosan Journal, 2005
4. Y.Hirose , A.Kawamura, "A New robust Control for the RF impedance matching Plasma processing," IEEJ SPC-08-128,2008