Preparation and photoelectric performance of Eu3+-doped porous TiO2 thin film electrode

Advanced Materials Research

Volumn 97-101, Issue , 2010, Pages 2209-2212

  Zhou, Yi ^a   Huang, Kelong ^b   Dang, Mingming ^a   Li, Hong ^a   Lv, Caixia ^a   Shi, Dehui ^a  

^a CHANGSHA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Coating method; Eu3+ doped; Photoelectric performance; The porous TiO2 thin film

Indexed keywords

COATING METHODS; DOPED-TIO; DOPING CONCENTRATION; DYE-SENSITIZED SOLAR CELLS; EU3+-DOPED; FILL FACTOR; FILM ELECTRODES; HYDROTHERMAL METHODS; NANOPOROUS TIO; OPTIMAL THICKNESS; PHOTOELECTRIC PROPERTY; POROUS TIO; SEM; SIMULATED SUNLIGHT; THIN-FILM ELECTRODE; TIO; UV-VIS-DRS; XRD;

COATINGS; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; EUROPIUM; FILM PREPARATION; OPEN CIRCUIT VOLTAGE; PHOTOELECTRICITY; RECONNAISSANCE AIRCRAFT; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; SWITCHING CIRCUITS; THIN FILMS; X RAY DIFFRACTION;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 77951018871     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.97-101.2209     Document Type: Conference Paper

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