In-situ metrology for the optimization of bent crystals used in hard-X-ray monochromators: Comparison between measurement and simulation

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 616, Issue 2-3, 2010, Pages 197-202

  Thomasset, Muriel ^a   Moreno, Thierry ^a   Capitanio, Blandine ^a   Idir, Mourad ^a   Bucourt, Samuel ^b  

^a SYNCHROTRON SOLEIL   (France)

^b Imagine Optic   (France)

Author keywords

Metrology; Monochromators commissioning; Sagittal crystals; Shack Hartmann

Indexed keywords

BEAM-LINES; BENDING MAGNET SOURCE; BENDING MAGNETS; BENDING SYSTEM; BENT CRYSTALS; CATASTROPHIC FAILURES; IN-SITU; IN-SITU METROLOGY; LONG TRACE PROFILER; MEASUREMENT AND SIMULATION; METROLOGY; MONOCHROMATOR CRYSTALS; OPTIMIZATION PROCESS; OPTIMIZED SYSTEM; PHOTON FLUX; PRIOR KNOWLEDGE; RADII OF CURVATURE; RADIUS OF CURVATURE; RAY TRACING SIMULATION; SAGITTAL CRYSTALS; SAGITTAL FOCUSING; SAMPLE POSITION; SHACK-HARTMANN; SHACK-HARTMANN SENSOR; SYNCHROTRON X-RAY RADIATION; TRANSLATION STAGE; X RAY BEAM; X-RAY IMAGE; X-RAY MONOCHROMATOR;

CRYSTALS; MAGNETS; MEASUREMENTS; MONOCHROMATORS; OPTIMIZATION; SYNCHROTRONS;

CURVE FITTING;

EID: 77950942395     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2009.12.034     Document Type: Article

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