Kinetics of nanoparticle reassembly mediated by UV-photolysis of surfactant

Langmuir

Volumn 26, Issue 8, 2010, Pages 5451-5455

  Siffalovic, Peter ^a   Chitu, Livia ^a   Majkova, Eva ^a   Vegso, Karol ^a   Jergel, Matej ^a   Luby, Stefan ^a   Capek, Ignac ^b   Satka, Alexander ^c   Maier, Guenther A ^d   Keckes, Jozef ^e   Timmann, Andreas ^f   Roth, Stephan V ^f  

^a INSTITUTE OF PHYSICS   (Slovakia)

^b POLYMER INSTITUTE   (Slovakia)

^c INTERNATIONAL LASER CENTER   (Slovakia)

^d MATERIALS CENTER LEOBEN FORSCHUNG GMBH   (Austria)

^e Erich Schmid Institute of Materials Science   (Austria)

^f DESY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXPONENTIAL DECAY FUNCTIONS; FIRST-ORDER PROCESS; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; IN-SITU; INTERPARTICLE DISTANCES; LENGTH SCALE; NANOPARTICLE MONOLAYERS; NANOPARTICLE PAIRS; NEAREST-NEIGHBORS; REASSEMBLY; TEMPORAL EVOLUTION; UV-OZONE; UV-PHOTOLYSIS;

EXPONENTIAL FUNCTIONS; MONOLAYERS; OZONE; PHOTOLYSIS; SURFACE ACTIVE AGENTS; X RAY SCATTERING;

NANOPARTICLES;

EID: 77950930949     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la904636g     Document Type: Article

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