Preparation of nanostructured Al2O3-TiO2 composite films by MOCVD

Journal of Alloys and Compounds

Volumn 495, Issue 2, 2010, Pages 617-619

  Pérez, J A Galaviz ^a   Valero, J A Montes de Oca ^b   García, J R Vargas ^a   Rosales, H J Dorantes ^a  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b Research Center on Applied Science and Advanced Technology   (Mexico)

Author keywords

Alumina titania; Composite films; MOCVD; Nanostructures

Indexed keywords

ALUMINA-TITANIA; ALUMINUM ACETYLACETONATE; CARRIER GAS; CRYSTALLINE STRUCTURE; DEPOSITION TEMPERATURES; EPMA; GLASS SUBSTRATES; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; NANO-STRUCTURED; SEM; TEM; TIO; TITANIUM PRECURSORS; TITANIUM TETRAISOPROPOXIDE; TOTAL PRESSURE; XRD;

ALUMINUM; ALUMINUM COATINGS; ARGON; CHEMICAL VAPOR DEPOSITION; ELECTRON PROBE MICROANALYSIS; FILM PREPARATION; NANOSTRUCTURES; OXYGEN; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE STRUCTURE; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION;

COMPOSITE FILMS;

EID: 77950929517     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.10.200     Document Type: Article

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