Defect structure and optical damage resistance of Hf:Fe:LiNbO3 crystals

Optics and Laser Technology

Volumn 42, Issue 7, 2010, Pages 1118-1121

  Shi, Hongxin ^a   Sun, Xiudong ^a   Luo, Suhua ^a   Jiang, Yongyuan ^a   Meng, Qingxin ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Defect structure; Optical damage resistance

Indexed keywords

BIREFRINGENCE; DEFECT STRUCTURES; DEFECTS; DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; HAFNIUM OXIDES; IRON COMPOUNDS; LIGHT ABSORPTION; LITHIUM COMPOUNDS; NIOBIUM COMPOUNDS; PHOTOVOLTAIC EFFECTS;

CZOCHRALSKI TECHNIQUE; DOPING CONCENTRATION; OPTICAL DAMAGE RESISTANCE; PHOTOINDUCED BIREFRINGENCE; THRESHOLD CONCENTRATIONS; TRANSMITTED LIGHT; UNUSUAL BEHAVIORS; UV VISIBLE ABSORPTION SPECTRUM;

CRYSTAL STRUCTURE;

EID: 77950867013     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2010.02.004     Document Type: Article

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