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Volumn , Issue , 2004, Pages

ESD protection for a 5.5 GHz LNA in 90 nm RF CMOS - Implementation concepts, constraints and solutions

Author keywords

[No Author keywords available]

Indexed keywords

ESD PROTECTION; ONCHIP INDUCTORS; PLUG-AND-PLAY; RF CMOS TECHNOLOGY; RF-CMOS;

EID: 77950850406     PISSN: 07395159     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EOSESD.2004.5272635     Document Type: Conference Paper
Times cited : (16)

References (9)
  • 1
    • 25144464884 scopus 로고    scopus 로고
    • Integration of a 90nm RF CMOS technology (200GHz fmax - 150GHz fT NMOS) demonstrated on a 5GHz LNA
    • Accepted at
    • W. Jeamsaksiri, et al., "Integration of a 90nm RF CMOS technology (200GHz fmax - 150GHz fT NMOS) demonstrated on a 5GHz LNA", Accepted at VLSI Symposium 2004.
    • (2004) VLSI Symposium
    • Jeamsaksiri, W.1
  • 2
    • 77950804069 scopus 로고    scopus 로고
    • Low-power 5 GHz LNA and VCO in 90 nm RF CMOS
    • Accepted at
    • D. Linten, et al., "Low-power 5 GHz LNA and VCO in 90 nm RF CMOS", Accepted at VLSI Symposium 2004.
    • (2004) Proc. EOS/ESD Symp.
    • Linten, D.1
  • 3
    • 22544457124 scopus 로고    scopus 로고
    • Comprehensive ESD protection for RF inputs
    • S. Hyvonen, et al., "Comprehensive ESD protection for RF inputs", Proc. EOS/ESD Symp., pp.188-194, 2003.
    • (2003) Elec. Lett. , pp. 188-194
    • Hyvonen, S.1
  • 4
    • 0035967020 scopus 로고    scopus 로고
    • High-performance 5.2GHz LNA with on-chip inductor to provide ESD protection
    • DOI 10.1049/el:20010271
    • P. Leroux, et al., "High-performance 5.2 GHz LNA with on-chip inductor to provide ESD protection", Elec. Lett., 37 (7), pp. 467-469, 2001. (Pubitemid 32395307)
    • (2001) Electronics Letters , vol.37 , Issue.7 , pp. 467-469
    • Leroux, P.1    Steyaert, M.2
  • 5
    • 11344293531 scopus 로고    scopus 로고
    • ESD protection design for Giga-Hz RF CMOS LNA with novel impedance-isolation technique
    • M. D. Ker, et al., "ESD Protection Design for Giga-Hz RF CMOS LNA with Novel Impedance-Isolation Technique", Proc. EOS/ESD Symp., pp. 204-213, 2003.
    • (2003) Proc. ESSDERC. , pp. 204-213
    • Ker, M.D.1
  • 6
    • 77950830358 scopus 로고    scopus 로고
    • Design-driven optimisation of a 90 nm RF CMOS process by use of elevated source/drain
    • D. Linten, et al., "Design-driven Optimisation of a 90 nm RF CMOS Process by use of Elevated Source/Drain", Proc. ESSDERC., pp 43-46, 2003.
    • (2003) IEEE J. Solid-State Circuits , pp. 43-46
    • Linten, D.1
  • 7
    • 0031147079 scopus 로고    scopus 로고
    • A 1.5V 1.5 GHz CMOS low noise amplifier
    • May
    • D.K. Shaeffer, et al., "A 1.5V 1.5 GHz CMOS Low Noise Amplifier", IEEEJ, Solid-State Circuits, vol. 32, pp. 745-759, May 1997.
    • (1997) Proc. INFOS , vol.32 , pp. 745-759
    • Shaeffer, D.K.1
  • 8
    • 77950829997 scopus 로고    scopus 로고
    • Weibull slope and voltage acceleration of ultra-thin (1.1-1.45 nm EOT) oxynitrides
    • paper GS26
    • R. O'Connor, et al., "Weibull Slope and Voltage Acceleration of Ultra-thin (1.1-1.45 nm EOT) Oxynitrides", Proc. INFOS, paper GS26, 2003
    • (2003) EOS/ESD Symp.
    • O'Connor, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.