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Japanese Journal of Applied Physics

Volumn 49, Issue 2 Part 1, 2010, Pages

P-Channel tin monoxide thin film transistor fabricated by vacuum thermal evaporation

(3) Lee, Ho Nyeon a Kim, Hyung Jung a Kim, Chang Kyo a

a Soonchunhyang University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS PHASE; AS-DEPOSITED FILMS; BOTTOM-CONTACT; CURRENT RATIOS; FIELD-EFFECT MOBILITIES; OXIDE SEMICONDUCTOR; P-TYPE; POLYCRYSTALLINE; SEMICONDUCTOR THIN FILMS; THERMAL-ANNEALING; VACUUM THERMAL EVAPORATION;

AMORPHOUS FILMS; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; HOLE CONCENTRATION; OXIDE FILMS; THIN FILM TRANSISTORS; THIN FILMS; TIN; TITANIUM COMPOUNDS; VACUUM; VACUUM EVAPORATION;

THERMAL EVAPORATION;

EID: 77950791171 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.020202 Document Type: Article

Times cited : (51)

References (12)

1
- 57049142035
- J. Kwon, K. Son, J. Jung, T. Kim, M. Ryu, K. Park, B. Yoo, J. Kim, Y. Lee, K. Park, S. Lee, and J. Kim: IEEE Electron Device Lett. 29 (2008) 1309.
- (2008) IEEE Electron Device Lett , vol.29 , pp. 1309
- Kwon, J.¹ Son, K.² Jung, J.³ Kim, T.⁴ Ryu, M.⁵ Park, K.⁶ Yoo, B.⁷ Kim, J.⁸ Lee, Y.⁹ Park, K.¹⁰ Lee, S.¹¹ Kim, J.¹²

2
- 67650483313
- J. Park, T. Kim, D. Stryakhilev, J. Lee, S. An, Y. Pyo, D. Lee, Y. Mo, D. Jin, and H. Chung: Appl. Phys. Lett. 95 (2009) 013503.
- (2009) Appl. Phys. Lett. , vol.95 , pp. 013503
- Park, J.¹ Kim, T.² Stryakhilev, D.³ Lee, J.⁴ An, S.⁵ Pyo, Y.⁶ Lee, D.⁷ Mo, Y.⁸ Jin, D.⁹ Chung, H.¹⁰

3
- 9744248669
- K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono: Nature 432 (2004) 488.
- (2004) Nature , vol.432 , pp. 488
- Nomura, K.¹ Ohta, H.² Takagi, A.³ Kamiya, T.⁴ Hirano, M.⁵ Hosono, H.⁶

4
- 41949130354
- P. Barquinha, A. M. Vilà, G. Gonçalves, L. Pereira, R. Martins, J. R. Morante, and E. Fortunato: IEEE Trans. Electron Devices 55 (2008) 954.
- (2008) IEEE Trans. Electron Devices , vol.55 , pp. 954
- Barquinha, P.¹ Vilà, A.M.² Gonçalves, G.³ Pereira, L.⁴ Martins, R.⁵ Morante, J.R.⁶ Fortunato, E.⁷

5
- 0037708293
- J. Nishii, F. M. Hossain, S. Takagi, T. Aita, K. Saikusa, Y. Ohmaki, I. Ohkubo, S. Kishimoto, A. Ohtomo, T. Fukumura, F. Matsukura, Y. Ohno, H. Koinuma, H. Ohno, and M. Kawasaki: Jpn. J. Appl. Phys. 42 (2003) L347.
- (2003) Jpn. J. Appl. Phys. , vol.42
- Nishii, J.¹ Hossain, F.M.² Takagi, S.³ Aita, T.⁴ Saikusa, K.⁵ Ohmaki, Y.⁶ Ohkubo, I.⁷ Kishimoto, S.⁸ Ohtomo, A.⁹ Fukumura, T.¹⁰ Matsukura, F.¹¹ Ohno, Y.¹² Koinuma, H.¹³ Ohno, H.¹⁴ Kawasaki, M.¹⁵

6
- 25844519780
- Q. Yao and D. Li: J. Non-Cryst. Solids 351 (2005) 3191.
- (2005) J. Non-Cryst. Solids , vol.351 , pp. 3191
- Yao, Q.¹ Li, D.²

7
- 33744507778
- W. B. Jackson, G. S. Herman, R. L. Hoffman, C. Taussig, S. Braymen, F. Jeffery, and J. Hauschildt: J. Non-Cryst. Solids 352 (2006) 1753.
- (2006) J. Non-Cryst. Solids , vol.352 , pp. 1753
- Jackson, W.B.¹ Herman, G.S.² Hoffman, R.L.³ Taussig, C.⁴ Braymen, S.⁵ Jeffery, F.⁶ Hauschildt, J.⁷

8
- 33744918047
- R. L. Hoffman: Solid-State Electron. 50 (2006) 784.
- (2006) Solid-State Electron , vol.50 , pp. 784
- Hoffman, R.L.¹

9
- 77950824523
- C. Ou, Dhananjay, Z. Ho, Y. Chuang, S. Cheng, M. Wu, K. Ho, and C. Chu: Appl. Phys. Lett. 92 (2008) 122113.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 122113
- Dhananjay, C.O.¹ Ho, Z.² Chuang, Y.³ Cheng, S.⁴ Wu, M.⁵ Ho, K.⁶ Chu, C.⁷

10
- 48249108407
- Y. Ogo, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono: Appl. Phys. Lett. 93 (2008) 032113.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 032113
- Ogo, Y.¹ Hiramatsu, H.² Nomura, K.³ Yanagi, H.⁴ Kamiya, T.⁵ Hirano, M.⁶ Hosono, H.⁷

11
- 4243154923
- K. Niwa, I. Yamai, and T. Wada: Bull. Chem. Soc. Jpn. 31 (1958) 725.
- (1958) Bull. Chem. Soc. Jpn. , vol.31 , pp. 725
- Niwa, K.¹ Yamai, I.² Wada, T.³

12
- 77950838381
- H. Lee: J. Korean Acad. Ind. Soc. 10 (2009) 1489.
- (2009) J. Korean Acad. Ind. Soc. , vol.10 , pp. 1489
- Lee, H.¹

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