Secondary neutral mass spectrometry-a powerful technique for quantitative elemental and depth profiling analyses of nanostructures

Spectroscopy Europe

Volumn 21, Issue 4, 2009, Pages 13-16

  Vad, Kálmán ^a   Csik, Attila ^a   Langer, Gábor A ^b  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b UNIVERSITY OF DEBRECEN   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL STATE OF ELEMENTS; DEPTH PROFILE; DEPTH RESOLUTION; DEPTH-PROFILING ANALYSIS; ELEMENTAL COMPOSITIONS; HIGH SENSITIVITY; ION SPUTTERING; ION-BEAM SPUTTERING; MATERIAL STRUCTURE; MATERIALS RESEARCH; MATRIX EFFECTS; MULTILAYER STRUCTURES; NANOMETRES; NEUTRAL MASS; PRODUCT QUALITY; SECONDARY IONS; SECONDARY NEUTRAL MASS SPECTROMETRY; SURFACE LAYERS;

CHEMICAL ELEMENTS; ELECTRON SPECTROSCOPY; IONS; NANOSTRUCTURES; SECONDARY ION MASS SPECTROMETRY; SPECTROMETRY; SPUTTERING;

DEPTH PROFILING;

EID: 77950361012     PISSN: 09660941     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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