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Volumn 24, Issue 6, 2009, Pages 832-836
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Influence of chemical vapor generation conditions on spectroscopic and analytical characteristics of a hyphenated CVG-ICP system
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON PLASMAS;
CHEMICAL VAPOR GENERATION;
ELECTRON NUMBER DENSITIES;
EXCITATION CONDITIONS;
EXCITATION TEMPERATURE;
FIGURES OF MERITS;
ICP SYSTEMS;
INTENSITY RATIO;
LOW CONCENTRATIONS;
MG II/MG I;
PLASMA PARAMETER;
REDUCTANTS;
ACIDS;
ARGON;
ELECTROMAGNETIC INDUCTION;
INDUCTIVELY COUPLED PLASMA;
LASER PRODUCED PLASMAS;
PLASMA DIAGNOSTICS;
REDUCING AGENTS;
VAPORS;
CHEMICAL VAPOR DEPOSITION;
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EID: 77950348334
PISSN: 02679477
EISSN: 13645544
Source Type: Journal
DOI: 10.1039/b816237a Document Type: Article |
Times cited : (11)
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References (33)
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