Optimizing tunnel FET performance - Impact of device structure, transistor dimensions and choice of material

International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Volumn , Issue , 2009, Pages 45-46

  Knoch, Joachim ^a  

^a TU DORTMUND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 77950076092     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VTSA.2009.5159285     Document Type: Conference Paper

References (10)

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