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Physics World
Volumn 10, Issue 4, 1997, Pages 41-45
Electron-beam lithography
Author keywords

[No Author keywords available]
Indexed keywords

EID: 77950054568     PISSN: 09538585     EISSN: None     Source Type: Trade Journal    
DOI: 10.1088/2058-7058/10/4/27     Document Type: Article
Times cited : (3)
References (9)
  • 1
    • 36549103511 scopus 로고
    • New approach to projectionelectron lithography with demonstrated 0.1 u.m linewidth
    • S D Berger and J M Gibson 1990 New approach to projectionelectron lithography with demonstrated 0.1 u.m linewidth Appl. Phys. Lett. 57 153
    • (1990) Appl. Phys. Lett. , vol.57 , pp. 153
    • Berger, S.D.1    Gibson, J.M.2
  • 2
    • 0017973616 scopus 로고
    • Design of a variable aper-ture projection and scanning system for electron beam
    • E Goto,T Soma and M Idesawa 1978 Design of a variable aper-ture projection and scanning system for electron beam J. Vac. Sci. Technol. 15 883
    • (1978) J. Vac. Sci. Technol. , vol.15 , pp. 883
    • Goto, E.1    Soma, T.2    Idesawa, M.3
  • 3
    • 0030288794 scopus 로고    scopus 로고
    • Preliminary results from a prototype projection electron-beam stepper - Scattering with angular limitation projection electron-beam lithography proof-of-concept system
    • L R Harriott et al. 1996 Preliminary results from a prototype projection electron-beam stepper - scattering with angular limitation projection electron-beam lithography proof-of-concept system J. Vac. Sci. Technol. B14 3825
    • (1996) J. Vac. Sci. Technol. , vol.B14 , pp. 3825
    • Harriott, L.R.1
  • 4
    • 0016528412 scopus 로고
    • EBES: A practical electron beam lithographic system IEEE Trans
    • D R Herriott et al. 1975 EBES: a practical electron beam lithographic system IEEE Trans. Electron Devices ED-29 (7) 385
    • (1975) Electron Devices ED-29 , vol.7 , pp. 385
    • Herriott, D.R.1
  • 5
    • 0016570163 scopus 로고
    • Electron-projection microfabrication system
    • M B Heritage 1975 Electron-projection microfabrication system J. Vac. Sci. Technol. 12 1135
    • (1975) J. Vac. Sci. Technol. , vol.12 , pp. 1135
    • Heritage, M.B.1
  • 6
    • 0000505521 scopus 로고
    • Electron-beam cell projection lithography: A new high-throughput electron-beam direct-writing technology using a specially tailored si aperture
    • Y Nakayama et al. 1990 Electron-beam cell projection lithography: a new high-throughput electron-beam direct-writing technology using a specially tailored si aperture J. Vac. Sci. Technol. B8 1836
    • (1990) J. Vac. Sci. Technol. , vol.B8 , pp. 1836
    • Nakayama, Y.1
  • 7
    • 0017972254 scopus 로고
    • Variable spot shaping for electron beam litho-graphy
    • H C Pfeiffer 1978 Variable spot shaping for electron beam litho-graphy J. Vac. Sci. Technol, 15 887
    • (1978) J. Vac. Sci. Technol , vol.15 , pp. 887
    • Pfeiffer, H.C.1
  • 8
    • 77950036851 scopus 로고    scopus 로고
    • P Rai-Choudhury (ed) Micromachining and Microfabrication (SPIE)
    • P Rai-Choudhury (ed) 1996 The Handbook of Microlithography, Micromachining and Microfabrication (SPIE)
    • (1996) The Handbook of Microlithography
  • 9
    • 0017971668 scopus 로고
    • Double aperture method of producing variable shaped writing spots for electron lithography
    • M G R Thomson, R J Collier and D R Herriott 1978 Double aperture method of producing variable shaped writing spots for electron lithography J. Vac. Sci. Technol. 15 891
    • (1978) J. Vac. Sci. Technol. , vol.15 , pp. 891
    • Thomson, M.G.R.1    Collier, R.J.2    Herriott, D.R.3

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.