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Volumn 9, Issue 4, 2010, Pages 291-292
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Graphene: What lies between
a
IFW DRESDEN
(Germany)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ENERGY GAP;
GAS ADSORPTION;
HYDROGENATION;
IRIDIUM;
PLASMA ETCHING;
SUBSTRATES;
CARBON ATOMS;
EXPOSED TO;
HYDROGENATED CARBON;
LARGE SCALE PRODUCTIONS;
PREFERENTIAL ADSORPTION;
GRAPHENE;
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EID: 77950008384
PISSN: 14761122
EISSN: 14764660
Source Type: Journal
DOI: 10.1038/nmat2733 Document Type: Short Survey |
Times cited : (13)
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References (10)
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