-
1
-
-
0032166781
-
Damascene copper plating for chip interconnections
-
Andricacos P C et al 1998 Damascene copper plating for chip interconnections IBM J. Res. Dev. 42 567-74
-
(1998)
IBM J. Res. Dev.
, vol.42
, pp. 567-574
-
-
Andricacos, P.C.1
-
2
-
-
42549126137
-
Mechanical and microstructural characterization of high aspect ratio through-wafer electroplated copper interconnects
-
Dixit P et al 2007 Mechanical and microstructural characterization of high aspect ratio through-wafer electroplated copper interconnects J. Micromech. Microeng. 17 1749-57
-
(2007)
J. Micromech. Microeng.
, vol.17
, pp. 1749-1757
-
-
Dixit, P.1
-
3
-
-
70349973201
-
Fabrication of high aspect ratio through-wafer copper interconnects by reverse pulse electroplating
-
Gu C et al 2009 Fabrication of high aspect ratio through-wafer copper interconnects by reverse pulse electroplating J. Micromech. Microeng. 19 065011
-
(2009)
J. Micromech. Microeng.
, vol.19
, pp. 065011
-
-
Gu, C.1
-
4
-
-
33846410639
-
Through-wafer electroplated copper interconnect with ultrafine grains and high density of nanotwins
-
Xu L et al 2007 Through-wafer electroplated copper interconnect with ultrafine grains and high density of nanotwins Appl. Phys. Lett. 90 033111
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 033111
-
-
Xu, L.1
-
5
-
-
60949091043
-
Filling of Microvia with an aspect ratio of 5 by copper electrodeposition
-
Lühn O et al 2009 Filling of Microvia with an aspect ratio of 5 by copper electrodeposition Electrochim. Acta 54 2504-8
-
(2009)
Electrochim. Acta
, vol.54
, pp. 2504-2508
-
-
Lühn, O.1
-
8
-
-
0033640274
-
Self-annealing characterization of electroplated copper films
-
Lagrange S et al 2000 Self-annealing characterization of electroplated copper films Microelectron. Eng. 50 449-57
-
(2000)
Microelectron. Eng.
, vol.50
, pp. 449-457
-
-
Lagrange, S.1
-
9
-
-
13244263039
-
Texture investigation of copper interconnects with a different line width
-
Cho J-Y et al 2005 Texture investigation of copper interconnects with a different line width J. Electron. Mater. 34 53-61
-
(2005)
J. Electron. Mater.
, vol.34
, pp. 53-61
-
-
Cho, J.-Y.1
-
10
-
-
18544402220
-
Microstructural characterization of inlaid copper interconnect lines
-
Besser P R et al 2001 Microstructural characterization of inlaid copper interconnect lines J. Electron. Mater. 30 320-30
-
(2001)
J. Electron. Mater.
, vol.30
, pp. 320-330
-
-
Besser, P.R.1
-
11
-
-
35348915635
-
Characterization of nano-grained high aspect ratio through-wafer copper interconnect column
-
(Reno, NV, USA)
-
Dixit P et al 2007 Characterization of nano-grained high aspect ratio through-wafer copper interconnect column Proc. ECTC Conf. (Reno, NV, USA) pp 2011-6
-
(2007)
Proc. ECTC Conf.
, pp. 2011-2016
-
-
Dixit, P.1
-
12
-
-
36849141789
-
Young's modulus, Shear modulus, and Poisson's ratio in silicon and germanium
-
Wortman J J et al 1965 Young's modulus, Shear modulus, and Poisson's ratio in silicon and germanium J. Appl. Phys. 36 153-6
-
(1965)
J. Appl. Phys.
, vol.36
, pp. 153-156
-
-
Wortman, J.J.1
-
13
-
-
12844266764
-
Effect of annealing on the structural, mechanical and Tribological properties of electroplated Cu thin films
-
Shukla P et al 2004 Effect of annealing on the structural, mechanical and Tribological properties of electroplated Cu thin films Mater. Res. Soc. Symp. Proc. 812 171-7
-
(2004)
Mater. Res. Soc. Symp. Proc.
, vol.812
, pp. 171-177
-
-
Shukla, P.1
-
14
-
-
0032186933
-
Textures of thin copper films
-
Kuschke W-M et al 1998 Textures of thin copper films J. Mater. Res. 13 2962-8
-
(1998)
J. Mater. Res.
, vol.13
, pp. 2962-2968
-
-
Kuschke, W.-M.1
-
15
-
-
0037394443
-
Correlation of stress and texture evolution during self- and thermal annealing of electroplated Cu films
-
Lee H et al 2003 Correlation of stress and texture evolution during self- and thermal annealing of electroplated Cu films J. Appl. Phys. 93 3796-804
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 3796-3804
-
-
Lee, H.1
-
16
-
-
0036353445
-
The Mechanical properties of electroplated Cu thin films measured by means of the bulge test technique
-
Xiang Y et al 2002 The Mechanical properties of electroplated Cu thin films measured by means of the bulge test technique Mater. Res. Soc. Symp. Proc. 695 L.4.9.1-6
-
(2002)
Mater. Res. Soc. Symp. Proc.
, vol.695
, pp. 491-6
-
-
Xiang, Y.1
-
17
-
-
50049086962
-
Effect of wire purity on copper wire bonding
-
(Singapore)
-
Srikanth N et al 2007 Effect of wire purity on copper wire bonding Proc. EPTC Conf. (Singapore) pp 755-9
-
(2007)
Proc. EPTC Conf.
, pp. 755-759
-
-
Srikanth, N.1
-
18
-
-
19944412737
-
Effects of residual stress on the thin-film elastic moduli calculated from surface acoustic wave spectroscopy experiments
-
Kumon R E et al 2005 Effects of residual stress on the thin-film elastic moduli calculated from surface acoustic wave spectroscopy experiments Thin Solid Films 484 251-6
-
(2005)
Thin Solid Films
, vol.484
, pp. 251-256
-
-
Kumon, R.E.1
-
20
-
-
40549141519
-
Uniformity effects when electrodepositing Cu onto resistive substrates in the presence of organic additives
-
Willey M J et al 2008 Uniformity effects when electrodepositing Cu onto resistive substrates in the presence of organic additives J. Electrochem. Soc. 155 D302-7
-
(2008)
J. Electrochem. Soc.
, vol.155
-
-
Willey, M.J.1
-
21
-
-
34250812463
-
Recent advances in 3D integration at IMEC
-
De Moor P et al 2007 Recent advances in 3D integration at IMEC Mater. Res. Soc. Symp. Proc. 970 3-12
-
(2007)
Mater. Res. Soc. Symp. Proc.
, vol.970
, pp. 3-12
-
-
De Moor, P.1
|