Chemisorbed thiols on silica particles: Characterization of reactive sulfur species

Journal of Physical Chemistry C

Volumn 114, Issue 11, 2010, Pages 5080-5087

  Caregnato, Paula ^a   Forbes, Malcolm D E ^b   Soria, Delia B ^c   Mártire, Daniel O ^a   Gonzalez, Mónica C ^a  

^a INSTITUTO DE INVESTIGACIONES FISICOQUÍMICAS TEÓRICAS Y APLICADAS INIFTA   (Argentina)

^b The University of North Carolina at Chapel Hill   (United States)

^c UNIVERSIDAD NACIONAL DE LA PLATA   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

3-MERCAPTOPROPYLTRIMETHOXYSILANE; ABSORBANCES; ABSORPTION MAXIMA; DECAY CHANNELS; DECAY KINETICS; FTIR; LASER FLASH EXCITATION; NMR SPECTROSCOPY; OPTICAL TECHNIQUE; PEROXODISULFATE; REACTIVE SULFUR SPECIES; SECOND ORDERS; SILANOL GROUPS; SILICA PARTICLES; SILICA SURFACE; SILYLATIONS; SULFUR-CENTERED RADICALS; THERMOGRAVIMETRY; THIOL GROUPS; THIYL RADICALS; WATER SUSPENSIONS; XPS SPECTROSCOPY;

CHEMISORPTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER EXCITATION; SILICA; SODIUM; SULFUR; THERMOGRAVIMETRIC ANALYSIS;

NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY;

EID: 77949782450     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp911253f     Document Type: Article

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