Light-induced stress relief to improve flaw tolerance in network polymers

Journal of Applied Physics

Volumn 107, Issue 5, 2010, Pages

  Long, Kevin N ^a   Dunn, Martin L ^a   Scott, Timothy F ^a   Turpin, Lucas P ^a   Qi, H Jerry ^a  

^a University of Colorado   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL STATE; ELEVATED STRESS; FINITE-ELEMENT APPROACH; FLAW TOLERANCE; IN-NETWORK; INDUCED STRESS; MECHANICAL BEHAVIOR; MODEL PREDICTION; MULTIAXIAL STRESS STATE; NETWORK EVOLUTION; NOMINAL STRESS; PHOTO-ACTIVATED; PHOTO-INDUCED STRESS; PHOTOMECHANICS; SELF-HEALING; UNCURED RESINS; UV LIGHT;

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); FINITE ELEMENT METHOD; FITS AND TOLERANCES; POLYMERS; RESIDUAL STRESSES; RESINS; STRESS RELAXATION;

STRESS RELIEF;

EID: 77949670371     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3311553     Document Type: Article

References (18)

1. R. P. Wool, Soft Matter 4, 400 (2008).
2. Y. C. Yuan, T. Yin, M. Z. Rong, and M. Q. Zhang, eXPRESS Polymer Letters 2, 238 (2008).
3. M. W. Keller, S. R. White, and N. R. Sottos, Polymer 49, 3136 (2008).
4. R. S. Trask, G. J. Williams, and I. P. Bond, J. R. Soc., Interface 4, 363 (2007).
5. S. R. White, N. R. Sottos, P. H. Geubelle, J. S. Moore, M. R. Kessler, S. R. Sriram, E. N. Brown, and S. Viswanathan, Nature (London) 409, 794 (2001).
6. A. M. Peterson, R. E. Jensen, and G. R. Palmese, ACS Applied Materials & Interfaces 1, 992 (2009).
7. X. F. Luo, R. Q. Ou, D. E. Eberly, A. Singhal, W. Viratyaporn, and P. T. Mather, ACS Applied Materials & Interfaces 1, 612 (2009).
8. M. A. M. Rahmathullah and G. R. Palmese, J. Appl. Polym. Sci. 113, 2191 (2009).
9. A. Han and Y. Qiao, Appl. Phys. Lett. 91, 173123 (2007).
10. W. Y. Lu, T. Kim, A. J. Han, X. Chen, and Y. Qiao, Langmuir 25, 9463 (2009).
11. T. F. Scott, R. B. Draughon, and C. N. Bowman, Adv. Mater. (Weinheim, Ger.) 18, 2128 (2006).
12. T. F. Scott, A. D. Schneider, W. D. Cook, and C. N. Bowman, Science 308, 1615 (2005).
13. W. D. Cook, S. Chausson, C. Fei, L. Le Pluart, C. N. Bowman, and T. F. Scott, Polym. Int. 57, 469 (2008).
14. K. N. Long, M. L. Dunn, T. F. Scott, and H. J. Qi, " Photo-Induced Creep of Network Polymers.," International Journal of Structural Changes in Solids-Mechanics and Applications (accepted).
15. K. N. Long, T. F. Scott, H. J. Qi, C. N. Bowman, and M. L. Dunn, J. Mech. Phys. Solids 57, 1103 (2009).
16. A. B. Davis and A. Marshak, J. Quant. Spectrosc. Radiat. Transf. 84, 3 (2004).
17. M. D. Goodner and C. N. Bowman, Chem. Eng. Sci. 57, 887 (2002).
18. J. L. Faria and S. Steenken, J. Chem. Soc., Perkin Trans. 2 1997, 1153.