Hydrogen behavior in nanocrystalline titanium thin films

Acta Materialia

Volumn 58, Issue 8, 2010, Pages 3042-3049

  Tal Gutelmacher, E ^a   Gemma, R ^a   Pundt, A ^a   Kirchheim, R ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Hydrogen; Sputtering; Stress; Thin films; Titanium

Indexed keywords

CRYSTALLINE ORIENTATIONS; GROWTH ORIENTATIONS; H SYSTEMS; HYDROGEN ABSORPTION; HYDROGEN BEHAVIOR; HYDROGEN CHARGING; HYDROGEN CONCENTRATION; IN-SITU STRESS MEASUREMENT; MICROSTRUCTURAL EFFECT; MISCIBILITY GAP; NANOCRYSTALLINES; PRESSURE-CONCENTRATION CURVES; SAPPHIRE SUBSTRATES; STRESS CONTRIBUTION; STRESS DEVELOPMENT; THIN FILM SYSTEMS; TI FILM; TITANIUM FILM; TITANIUM THIN FILMS;

ELECTROMOTIVE FORCE; PHASE TRANSITIONS; THERMODYNAMICS; THIN FILMS; TITANIUM; X RAY DIFFRACTION;

HYDROGEN;

EID: 77949568450     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2010.01.036     Document Type: Article

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