Effect of ultraviolet radiation from an oxygen plasma on the atomic oxygen-induced etching of fluorinated polymer

High Performance Polymers

Volumn 22, Issue 2, 2010, Pages 213-224

  Tagawa, Masahito ^a   Yokota, Kumiko ^a   Kishida, Kazuhiro ^a   Okamoto, Akio ^b   Ishizawa, Junichiro ^c   Minton, Timothy K ^d  

^a KOBE UNIVERSITY   (Japan)

^b OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

^c JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^d MONTANA STATE UNIVERSITY   (United States)

Author keywords

Atomic oxygen; FEP Teflon; Low Earth orbit; Space environment; Synergistic effect; Ultraviolet

Indexed keywords

ATOMIC OXYGEN; BEAM SOURCES; CHOPPER WHEEL; EXCIMER LAMPS; EXPOSURE CONDITIONS; EXTREME ULTRAVIOLETS; FLUORINATED POLYMERS; FREQUENCY SHIFT; GROUND-BASED LASERS; HIGH-SPEED; LASER PLASMA; LOW EARTH ORBIT SPACE ENVIRONMENT; MASS CHANGE; MASS LOSS; OXYGEN PLASMAS; SYNERGISTIC EFFECT; VACUUM ULTRAVIOLETS;

ATOMS; BIOLOGICAL MATERIALS; COMMUNICATION SATELLITES; DETONATION; EARTH (PLANET); ORBITS; OXIDE MINERALS; OXYGEN; PHOTORESISTS; PLASMAS; POLYIMIDES; POLYMERS; QUARTZ; ULTRAVIOLET DEVICES; ULTRAVIOLET RADIATION;

ULTRAVIOLET LASERS;

EID: 77949560681     PISSN: 09540083     EISSN: 13616412     Source Type: Journal    
DOI: 10.1177/0954008309335941     Document Type: Article

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