Microstructure change in poly(ethersulfone) films by swift heavy ions

Micron

Volumn 41, Issue 4, 2010, Pages 390-394

  Kulshrestha, Vaibhav ^a   Agarwal, Garima ^a   Awasthi, Kamlendra ^a,b   Tripathi, Balram ^a   Acharya, N K ^d   Vyas, Devendra ^a   Saraswat, Vibhav K ^c   Vijay, Y K ^a   Jain, I P ^a  

^a UNIVERSITY OF RAJASTHAN   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^c BANASTHALI UNIVERSITY   (India)

^d M S UNIVERSITY OF BARODA   (India)

Author keywords

AFM; DMA; FTIR; PES; UV vis; XRD

Indexed keywords

AFM; CRYSTALLINITIES; FOURIER TRANSFORM INFRARED; FTIR; GRAIN SIZE; HIGH-ENERGY IONS; IRRADIATED SAMPLES; MICROSTRUCTURE CHANGES; POLYMER CHAINS; SCHERRER FORMULA; STRUCTURE DEGRADATION; SWIFT HEAVY IONS; X-RAY DIFFRACTION TECHNIQUES; XRD;

ABSORPTION; ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; DYNAMIC ANALYSIS; DYNAMIC MECHANICAL ANALYSIS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN SIZE AND SHAPE; IONS; MICROSTRUCTURE; OPTICAL PROPERTIES; PHOTODEGRADATION; SURFACE ROUGHNESS; X RAY DIFFRACTION;

X RAY DIFFRACTION ANALYSIS;

EID: 77949490237     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micron.2009.12.003     Document Type: Article

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