The role of substrate electrons in the wetting of a metal surface

Journal of Chemical Physics

Volumn 132, Issue 9, 2010, Pages

  Schiros, T ^a,b,f   Takahashi, O ^b,c   Andersson, K J ^d   Ostrom H ^b   Pettersson, L G M ^b   Nilsson, A ^a,b,e   Ogasawara, H ^a,b,e  

^a SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^b STOCKHOLM UNIVERSITY   (Sweden)

^c HIROSHIMA UNIVERSITY   (Japan)

^d TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^e SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^f Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC ROWS; CHARGE DEPLETION; CLOSED SHELLS; CLUSTER FORMATIONS; CU(1 1 0); CU(1 1 1); D-ELECTRONS; DIFFERENT MECHANISMS; DISTRIBUTION OF METAL; ELECTRONIC CONFIGURATION; ELECTROSTATIC ATTRACTIONS; GEOMETRIC STRUCTURE; HYDROPHOBIC SURFACES; ISOSTRUCTURAL; LIGAND FIELD; METAL BONDING; METAL SURFACES; PAULI REPULSION; PT(111); SURFACE WETTING; WETTING LAYER;

ELECTRONS; HYDROPHOBICITY; METALS; PLATINUM; SURFACE CHEMISTRY; WETTING;

TWO DIMENSIONAL;

EID: 77949401293     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3292681     Document Type: Article

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