SCOPUS 정보 검색 플랫폼

Volumn 96, Issue 9, 2010, Pages

Electron beam induced current investigations of Pt/SrTiO3-x interface exposed to chemical and electrical stresses

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE; CONTRAST CHANGES; ELECTRICAL STRESS; ELECTRON-BEAM-INDUCED CURRENT; ETCH PITS; OXYGEN DEFICIENT; SCHOTTKY CONTACTS; SRTIO;

ATOMIC FORCE MICROSCOPY; DISLOCATIONS (CRYSTALS); ELECTRON BEAMS; OXYGEN; OXYGEN VACANCIES; PLATINUM; SINGLE CRYSTALS; STRONTIUM ALLOYS;

ELECTRIC CURRENTS;

EID: 77949349043 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3339303 Document Type: Article

Times cited : (10)

References (15)

1
- 33645641019
- NMAACR 1476-1122. 10.1038/nmat1614
- K. Szot, W. Speier, G. Bihlmayer, and R. Waser, Nature Mater. NMAACR 1476-1122 5, 312 (2006). 10.1038/nmat1614
- (2006) Nature Mater. , vol.5 , pp. 312
- Szot, K.¹ Speier, W.² Bihlmayer, G.³ Waser, R.⁴

2
- 34249005314
- APPLAB 0003-6951. 10.1063/1.2739081
- H. S. Lee, J. A. Bain, S. Choi, and P. A. Salvador, Appl. Phys. Lett. APPLAB 0003-6951 90, 202107 (2007). 10.1063/1.2739081
- (2007) Appl. Phys. Lett. , vol.90 , pp. 202107
- Lee, H.S.¹ Bain, J.A.² Choi, S.³ Salvador, P.A.⁴

3
- 34548656097
- ADVMEW 0935-9648. 10.1002/adma.200602915
- M. Janousch, G. I. Meijer, U. Staub, B. Delley, S. F. Karg, and B. P. Andreasson, Adv. Mater. ADVMEW 0935-9648 19, 2232 (2007). 10.1002/adma.200602915
- (2007) Adv. Mater. , vol.19 , pp. 2232
- Janousch, M.¹ Meijer, G.I.² Staub, U.³ Delley, B.⁴ Karg, S.F.⁵ Andreasson, B.P.⁶

4
- 67649143212
- NNOTER 0957-4484. 10.1088/0957-4484/20/21/215201
- J. J. Yang, F. Miao, M. D. Pickett, D. A. A. Ohlberg, D. R. Stewart, C. N. Lau, and R. S. Williams, Nanotechnology NNOTER 0957-4484 20, 215201 (2009). 10.1088/0957-4484/20/21/215201
- (2009) Nanotechnology , vol.20 , pp. 215201
- Yang, J.J.¹ Miao, F.² Pickett, M.D.³ Ohlberg, D.A.A.⁴ Stewart, D.R.⁵ Lau, C.N.⁶ Williams, R.S.⁷

5
- 50849149994
- JPCSAW 0022-3697. 10.1016/0022-3697(67)90114-X
- L. C. Walters and R. E. Grace, J. Phys. Chem. Solids JPCSAW 0022-3697 28, 239 (1967). 10.1016/0022-3697(67)90114-X
- (1967) J. Phys. Chem. Solids , vol.28 , pp. 239
- Walters, L.C.¹ Grace, R.E.²

6
- 0029387033
- APAMFC 0947-8396. 10.1007/BF01540113
- R. Moos, W. Menesklou, and K. H. Härdtl, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 61, 389 (1995). 10.1007/BF01540113
- (1995) Appl. Phys. A: Mater. Sci. Process. , vol.61 , pp. 389
- Moos, R.¹ Menesklou, W.² Härdtl, K.H.³

7
- 0032613386
- JAPIAU 0021-8979. 10.1063/1.370539
- T. Shimizu and H. Okushi, J. Appl. Phys. JAPIAU 0021-8979 85, 7244 (1999). 10.1063/1.370539
- (1999) J. Appl. Phys. , vol.85 , pp. 7244
- Shimizu, T.¹ Okushi, H.²

8
- 21544482401
- JAPIAU 0021-8979. 10.1063/1.331667
- H. J. Leamy, J. Appl. Phys. JAPIAU 0021-8979 53, R51 (1982). 10.1063/1.331667
- (1982) J. Appl. Phys. , vol.53 , pp. 51
- Leamy, H.J.¹

9
- 0037127851
- PRLTAO 0031-9007. 10.1103/PhysRevLett.88.075508
- K. Szot, W. Speier, R. Carius, U. Zastrow, and W. Beyer, Phys. Rev. Lett. PRLTAO 0031-9007 88, 075508 (2002). 10.1103/PhysRevLett.88.075508
- (2002) Phys. Rev. Lett. , vol.88 , pp. 075508
- Szot, K.¹ Speier, W.² Carius, R.³ Zastrow, U.⁴ Beyer, W.⁵

10
- 34548207207
- APAMFC 0947-8396. 10.1007/s00339-007-4134-2
- B. Psiuk, J. Szade, H. Schroeder, H. Haselier, M. Mynarczyk, R. Waser, and K. Szot, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 89, 451 (2007). 10.1007/s00339-007-4134-2
- (2007) Appl. Phys. A: Mater. Sci. Process. , vol.89 , pp. 451
- Psiuk, B.¹ Szade, J.² Schroeder, H.³ Haselier, H.⁴ Mynarczyk, M.⁵ Waser, R.⁶ Szot, K.⁷

11
- 27944435285
- APPLAB 0003-6951. 10.1063/1.2138808
- X. L. Li, B. Chen, H. Y. Jing, H. B. Lu, B. R. Zhao, Z. H. Mai, and Q. J. Jia, Appl. Phys. Lett. APPLAB 0003-6951 87, 222905 (2005). 10.1063/1.2138808
- (2005) Appl. Phys. Lett. , vol.87 , pp. 222905
- Li, X.L.¹ Chen, B.² Jing, H.Y.³ Lu, H.B.⁴ Zhao, B.R.⁵ Mai, Z.H.⁶ Jia, Q.J.⁷

12
- 33646673156
- APAMFC 0947-8396. 10.1007/s00339-006-3584-2
- D. C. Meyer, A. A. Levin, T. Leisegang, E. Gutmann, P. Paufler, M. Reibold, and W. Pompe, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 84, 31 (2006). 10.1007/s00339-006-3584-2
- (2006) Appl. Phys. A: Mater. Sci. Process. , vol.84 , pp. 31
- Meyer, D.C.¹ Levin, A.A.² Leisegang, T.³ Gutmann, E.⁴ Paufler, P.⁵ Reibold, M.⁶ Pompe, W.⁷

13
- 0037428685
- APPLAB 0003-6951. 10.1063/1.1544440
- K. Otsuka, A. Kuwabara, A. Nakamura, T. Yamamoto, K. Matsunaga, and Y. Ikuhara, Appl. Phys. Lett. APPLAB 0003-6951 82, 877 (2003). 10.1063/1.1544440
- (2003) Appl. Phys. Lett. , vol.82 , pp. 877
- Otsuka, K.¹ Kuwabara, A.² Nakamura, A.³ Yamamoto, T.⁴ Matsunaga, K.⁵ Ikuhara, Y.⁶

14
- 4243399610
- PRLTAO 0031-9007. 10.1103/PhysRevLett.86.4056
- M. Kim, G. Duscher, N. D. Browning, K. Sohlberg, S. T. Pantelides, and S. J. Pennycook, Phys. Rev. Lett. PRLTAO 0031-9007 86, 4056 (2001). 10.1103/PhysRevLett.86.4056
- (2001) Phys. Rev. Lett. , vol.86 , pp. 4056
- Kim, M.¹ Duscher, G.² Browning, N.D.³ Sohlberg, K.⁴ Pantelides, S.T.⁵ Pennycook, S.J.⁶

15
- 68349144891
- JELJA7 0022-0744. 10.1093/jmicro/dfn026
- R. F. Klie, W. Walkosz, G. Yang, and Y. Zhao, J. Electron Microsc. JELJA7 0022-0744 58, 185 (2009). 10.1093/jmicro/dfn026
- (2009) J. Electron Microsc. , vol.58 , pp. 185
- Klie, R.F.¹ Walkosz, W.² Yang, G.³ Zhao, Y.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.