Influence of fluoride ion on the electrochemical behaviour of β-Ti alloy for dental implant application

Corrosion Science

Volumn 52, Issue 5, 2010, Pages 1721-1727

  Kumar, Satendra ^a   Sankara Narayanan, T S N ^a   Saravana Kumar, S ^b  

^a NATIONAL METALLURGICAL LABORATORY   (India)

^b Vidyalaya College of Arts and Science   (India)

Author keywords

A. Titanium; B. EIS; B. Polarization; B. X ray diffraction; C. Passive films

Indexed keywords

A. TITANIUM; B. X-RAY DIFFRACTION; CORROSION BEHAVIOUR; DENTAL IMPLANT APPLICATIONS; ELECTROCHEMICAL BEHAVIOUR; FLUORIDE ION; PASSIVE FILMS; POTENTIAL RANGE; STEADY-STATE CURRENTS; TI ALLOYS; TI-6AL-4V ALLOY;

ALLOYS; ALUMINUM; CORROSION RESISTANCE; DENTAL PROSTHESES; ELECTROCHEMICAL CORROSION; MOLYBDENUM; POLARIZATION; SODIUM CHLORIDE; TITANIUM; TITANIUM METALLOGRAPHY; X RAY DIFFRACTION;

TITANIUM ALLOYS;

EID: 77949337491     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2010.01.008     Document Type: Article

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