Atomic roughness of an intrinsically chiral surface orientation of an FCC metal: Cu{531}

Journal of Physical Chemistry C

Volumn 114, Issue 9, 2010, Pages 4114-4117

  Clegg, Marian L ^a   Driver, Stephen M ^a   Blanco Rey, Maria ^a   King, David A ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC ROUGHNESS; ATOMIC SCALE ROUGHNESS; BULK TERMINATION; CHIRAL METAL SURFACES; CHIRAL MOLECULE; CHIRAL SURFACE; CHIRAL UNITS; ENANTIOSELECTIVE; FCC METALS; HETEROGENEOUS CATALYSIS; SCANNING TUNNELLING MICROSCOPY; THERMAL ROUGHENING;

ADSORPTION; CATALYSIS; ELECTRON DIFFRACTION; HOLOGRAPHIC INTERFEROMETRY; SCANNING TUNNELING MICROSCOPY;

METALS;

EID: 77949310989     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp9118869     Document Type: Article

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