Low-temperature and normal-pressure growth of oriented rutile TiO2 nanorod arrays on F-doped tin oxide substrate

Scripta Materialia

Volumn 62, Issue 10, 2010, Pages 810-813

  Zeng, Qinghui ^a   Wu, Liangzhuan ^a   Zhang, Yang ^a   Qi, Bin ^a   Zhi, Jinfang ^a  

^a TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

Author keywords

Dye sensitized solar cells; FTO substrate; Low temperature; Rutile nanorod arrays; Synthesis

Indexed keywords

DYE-SENSITIZED SOLAR CELL; DYE-SENSITIZED SOLAR CELLS; LOW TEMPERATURES; NANOPARTICLE FILMS; NANOROD ARRAYS; PHOTO-ANODES; PRESSURE GROWTH; RUTILE TIO; TRANSPARENT CONDUCTIVE;

OXIDE MINERALS; PHOTOELECTROCHEMICAL CELLS; SOLAR CELLS; SUBSTRATES; TIN; TITANIUM COMPOUNDS;

NANORODS;

EID: 77949261496     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2010.01.054     Document Type: Article

References (27)

1. Wu J.M., Zhang T.W., Zeng Y.W., Hayakawa S., Tsuru K., and Osaka A. Langmuir 21 (2005) 6995
2. Liu Z., Pesic B., Raja K.S., Rangaraju R.R., and Misra M. Int. J. Hydrogen Energy 34 (2009) 3250
3. Mor G.K., Shankar K., Paulose M., Varghese O.K., and Grimes C.A. Nano Lett. 5 (2005) 191
4. Su F.Z., He L., Ni J., Cao Y., He H.Y., and Fan K.N. Chem. Commun. (2008) 3531
5. Lim S.H., Luo J., Zhong Z., Ji W., and Lin J. Inorg. Chem. 44 (2005) 4124
6. Cozzoli P.D., Kornowski A., and Weller H. J. Am. Chem. Soc. 125 (2003) 14539
7. Chu S.Z., Inoue S., Wada K., Hishita S., and Kurashima K. Adv. Funct. Mater. 15 (2005) 1343
8. Mohapatra S.K., Kondamudi N., Banerjee S., and Misra M. Langmuir 24 (2008) 11276
9. Lee J.H., Leu I.C., Hsu M.C., Chung Y.W., and Hon M.H. J. Phys. Chem. B 109 (2005) 13056
10. Wang K., Wei M., Morris M.A., Zhou H., and Holmes J.D. Adv. Mater. 19 (2007) 3016
11. Pradhan S.K., Reucroft P.J., Yang F., and Dozier A. J. Cryst. Growth 256 (2003) 83
12. Liu B., and Aydil E.S. J. Am. Chem. Soc. 131 (2009) 3985
13. Feng X., Shankar K., Varghese O.K., Paulose M., Latempa T.J., and Grimes C.A. Nano Lett. 8 (2008) 3781
14. Tahir M.N., Theato P., Oberle P., Melnyk G., Faiss S., Kolb U., Janshoff A., Stepputat M., and Tremel W. Langmuir 22 (2006) 5209
15. Kaneko S., and Imoto F. Nippon Kagaku Kaishi 6 (1975) 985
16. Finnegan M.P., Zhang H., and Banfield J.F. J. Phys. Chem. C 111 (2007) 1962
17. Ribeiro C., Longo E., and Leite E.R. Appl. Phys. Lett. 91 (2007) 103105
18. Zhang Y., Wu L., Zeng Q., and Zhi J. J. Phys. Chem. C 112 (2008) 16457
19. Eckert Jr. J.O., Hung-Houston C.C., Gersten B.L., Lencka M.M., and Riman R.E. J. Am. Ceram. Soc. 79 (1996) 2929
20. Mor G.K., Shankar K., Paulose M., Varghese O.K., and Grimes C.A. Nano Lett. 6 (2006) 215
21. Kuang D., Ito S., Wenger B., Klein C., Moser J.E., Humphry-Baker R., Zakeeruddin S.M., and Gratzel M. J. Am. Chem. Soc. 128 (2006) 4146
22. Bwana N.N. J. Nanopart. Res. 11 (2009) 1905
23. Hosono E., Fujihara S., Kakiuchi K., and Imai H. ACS Nano 1 (2007) 273
24. Jun Y., Choi J., and Cheon J. Angew. Chem. Int. Ed. 45 (2006) 3414
25. Adachi M. J. Am. Chem. Soc. 126 (2004) 7790
26. Jun Y., Lee S.M., Kang N.J., and Cheon J. J. Am. Chem. Soc. 123 (2001) 5150
27. Dinh C.T., Nguyen T.D., Kleitz F., and Do T.O. ACS Nano 3 (2009) 3737