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Volumn 12, Issue 11, 2010, Pages 2582-2589

Improved reliability from a plasma-assisted metal-insulator-metal capacitor comprising a high-k HfO2 film on a flexible polyimide substrate

(5) Singh Meena, Jagan a Chu, Min Ching a Kuo, Shiao Wei b Chang, Feng Chih a Ko, Fu Hsiang a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 77749304918 PISSN: 14639076 EISSN: None Source Type: Journal
DOI: 10.1039/b917604g Document Type: Article

Times cited : (27)

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