A comparison between physically and chemically driven etching in the oxidation of graphite surfaces

Journal of Colloid and Interface Science

Volumn 344, Issue 2, 2010, Pages 451-459

  Solis Fernandez P ^a   Paredes, J I ^a   Cosio A ^a   Martinez Alonso A ^a   Tascon J M D ^a  

^a INSTITUTO NACIONAL DEL CARBÓN   (Spain)

Author keywords

Etching; Graphite; Oxidation; Plasma; Scanning tunneling microscopy

Indexed keywords

AIR PLASMAS; ATOMIC SCALE; ATOMIC VACANCIES; ATOMIC-SCALE DEFECTS; CARBON MATERIAL; DIELECTRIC BARRIER DISCHARGES; DIFFERENT MECHANISMS; ETCHING MECHANISM; ETCHING SELECTIVITY; GRAPHITE SURFACES; OXIDATIVE TREATMENT; PHYSICAL PROCESS; SCANNING TUNNELING MICROSCOPY (STM); SURFACE MODIFICATION; XPS DATA;

ATOMIC SPECTROSCOPY; ATOMS; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; ETCHING; GRAPHITE; ION BOMBARDMENT; OXIDATION; OZONE; PLASMAS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING; SCANNING TUNNELING MICROSCOPY; SURFACE DEFECTS; SURFACE STRUCTURE; WIND TUNNELS;

X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON; GRAPHITE; OZONE;

ARTICLE; CONTROLLED STUDY; ELECTRIC CURRENT; INTERMETHOD COMPARISON; MOLECULAR MECHANICS; OXIDATION REDUCTION REACTION; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; PROCESS TECHNOLOGY; RAMAN SPECTROMETRY; SCANNING TUNNELING MICROSCOPY; SURFACE PROPERTY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMISTRY, PHYSICAL; GRAPHITE; OXIDATION-REDUCTION; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 77649236042     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2010.01.018     Document Type: Article

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