Electrochemical behavior of low phosphorus electroless Ni-P-Si3N4 composite coatings

Materials Chemistry and Physics

Volumn 120, Issue 2-3, 2010, Pages 546-551

  Balaraju, J N ^a   Ezhil Selvi, V ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

EIS; Electroless; Low phosphorus; Ni P Si3N4

Indexed keywords

CODEPOSITION; CORROSION CURRENT DENSITIES; DEAERATED CONDITIONS; EIS; EIS STUDIES; ELECTROCHEMICAL BEHAVIORS; ELECTROCHEMICAL IMPEDANCE; ELECTROLESS; ELECTROLESS NI-P; NI-P DEPOSITS; NODULARITY; P-MATRICES; PHOSPHORUS CONTENTS; SCANNING ELECTRON MICROSCOPES; SECOND PHASE PARTICLES; SEM ANALYSIS; SODIUM CHLORIDE SOLUTION; SUBMICRON SIZE;

DEPOSITS; ELECTROCHEMICAL CORROSION; PHOSPHORUS; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON NITRIDE; SODIUM; SODIUM CHLORIDE;

COMPOSITE COATINGS;

EID: 77649233016     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.11.047     Document Type: Article

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