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Volumn 16, Issue 46, 2009, Pages 93-101
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Depositing mechanism of metal oxide thin film in the liquid phase deposition process
a a a a
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KOBE UNIVERSITY
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINA;
ALUMINUM OXIDE;
ELECTRODEPOSITION;
ELECTRODES;
LIQUIDS;
METALS;
MOLECULAR STRUCTURE;
SILICON;
URANIUM METALLOGRAPHY;
VANADIUM METALLOGRAPHY;
AL-METAL;
AL2O3 POWDER;
DEPOSITION PROCESS;
EQUILIBRIUM REACTIONS;
FLUOROSILICATE;
LIQUID PHASE DEPOSITIONS (LPD);
METAL OXIDE THIN FILMS;
METAL OXIDES;
PHASE INTERFACES;
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EID: 77649216762
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.3169324 Document Type: Conference Paper |
Times cited : (1)
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References (18)
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