Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

IEEE Photonics Technology Letters

Volumn 16, Issue 11, 2004, Pages 2478-2480

  Barbarin, Y ^a   Leijtens, X J M ^a   Bente, E A J M ^a   Louzao, C M ^a   Kooiman, J R ^a   Smit, M K ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSTALK; DEMULTIPLEXING; ETCHING; INSERTION LOSSES; INTEGRATED OPTICS; OPTICAL COMMUNICATION EQUIPMENT; OPTICAL WAVEGUIDES; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE MANUFACTURE; WAVELENGTH DIVISION MULTIPLEXING;

ARRAYED WAVEGUIDE GRATING (AWG); DOUBLE ETCH PROCESS; PHASED ARRAY; SEMICONDUCTOR WAVEGUIDE;

DIFFRACTION GRATINGS;

EID: 7744232110     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2004.835217     Document Type: Article

References (7)

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