Molecular auxetic behavior of epitaxial co-ferrite spinel thin film

Advanced Functional Materials

Volumn 20, Issue 4, 2010, Pages 644-647

  Valant, Matjaz ^a,b   Axelsson, Anna Karin ^b   Aguesse, Frederic ^b   Alford, Neil M ^b  

^a UNIVERSITY OF NOVA GORICA   (Slovenia)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AUXETIC BEHAVIOR; AXIAL STRAIN; CELL DIMENSIONS; CO FERRITES; EPITAXIAL THIN FILMS; FUNCTIONAL OXIDES; FUNCTIONAL PROPERTIES; HONEYCOMB NETWORKS; NANO-DEVICES; NEGATIVE POISSON'S RATIOS; POISSON'S RATIO; SPINEL STRUCTURE; TRANSVERSE DIRECTIONS;

POISSON DISTRIBUTION; POISSON EQUATION; THIN FILM DEVICES; THIN FILMS;

POISSON RATIO;

EID: 77249145910     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200901762     Document Type: Article

References (30)

1. R. Lakes, Science 1987, 235, 1038.
2. K. E. Evans, M. A. Nkansah, I. J. Hutchinson, S. C. Rogers, Nature 1991, 353, 124.
3. K. E. Evans, A. Alderson, Adv. Mater. 2000, 12, 617.
4. M. Bowick, A. Cacciuto, G. Thorleifsson, A. Travesset, Phys. Rev. Lett. 2001, 84, 148103.
5. R. H. Baughman, J. M. Shacklette, A. A. Zakhidov, S. Stafström, Nature 1998, 392, 362.
6. L. J. Hall, V. R. Coluci, D. S. Galvão, M. E. Kozlov, M. Zhang, S. O. Dantas, R. H. Baughman, Science 2008, 320, 504.
7. L. Z. Chen, C. Liu, J. Wang, W. Zhang, C. Hu, S. Fan, Appl. Phys. Lett. 2009, 94, 253111.
8. N. Gaspar, X. J. Ren, C. W. Smith, J. N. Grima, K. E. Evans, Act. Mater. 2005, 53, 2439.
9. A. Alderson, J. Rasburn, S. Ameer-Beg, P. G. Mullarkey, W. P. Herrie, K. E. Evans, Ind. Eng. Chem. Res. 2000, 39, 654.
10. V. V. Novikov, K. W. Wojciechowski, Phys. Solid State 1999, 41, 1970.
11. A. C. Branka, D. M. Heyes, K. W. Wojciechowski, Phys. Status Solidi B 2009, 246, 2063.
12. R. H. Baughman, S. Staftström, C. Cui, S. O. Dantas, Science 1998, 279, 1522.
13. G. B. Gradner, D. Venkataraman, J. S. Moore, S. Lee, Nature 1995, 374, 792.
14. A. Yeganeh-Haeri, D. J. Weidner, J. B. Parise, Science 1992, 257, 650.
15. J. N. Grima, R. Jackson, A. Alderson, K. E. Evans, Adv. Mater. 2000, 12, 1912.
16. J. N. Grima, A. Alderson, K. E. Evans, J. Mater. Chem. 2005, 15, 4003.
17. C. Sanchez-Valle, J. Chem. Phys. 2008, 128, 184503.
18. X. Tan, W. Jo, T. Granzow, J. Frederick, E. Aulbach, J. Rodel, Appl. Phys. Lett. 2009, 94, 042909.
19. M. Valant, A.-K. Axelsson, B. Zou, N. M. Alford, J. Optoelectr. Adv. Mater. 2007, 9, 1377.
20. J. Y. Son, C. S. Park, Y. H. Shina, Appl. Phys. Lett. 2008, 92, 222911.
21. Y. F. Chen, D. Spoddig, M. Ziese, J. Phys. D: Appl. Phys. 2008, 41, 205004.
22. J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, R. Ramesh, Science 2003, 299, 1719.
23. B. D. Cullity, S. R. Stock, in: Elements of X-Ray Diffraction (Ed: M. Cohen), Addison-Wesley, Reading, Massachusetts 2001.
24. P. E. Y. Flewitt, R. K. Wild, in: Physical Methods for Material Characterization (Eds: B. Cantor, M. J. Goringe), Institute of Physics Publishing, Philadelphia 1994.
25. G. Hu, J. H. Choi, C. B. Eom, V. G. Harris, Y. Suzuki, Phys. Rev. B 2000, 62, R779.
26. R. H. Baughman, D. S. Galvão, Nature 1993, 365, 735.
27. R. M. Bozorth, E. F. Tilden, A. J. Williams, Phys. Rev. 1955, 99, 1788.
28. Z. Wang, X. Liu, M. Lv, P. Chai, Y. Liu, X. Zhou, J. Meng, J. Phys. Chem. C 2008, 112, 15171.
29. Z. Chunye, S. Xlangqian, Z. Jianxin, S. Jiangying, Rare Metal Materials and Engineering 2008, 37, 180.
30. L. Xiao, Z. Chen, C. Feng, L. Liu, Z.-Q. Bai, Y. Wang, L. Qian, Y. Zhang, Q. Li, K. Jiang, S. Fan, Nano Lett. 2008, 8, 4539.