Defect structure and optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios

Crystal Research and Technology

Volumn 45, Issue 3, 2010, Pages 249-253

  Sun, Xiudong ^a   Shi, Hongxin ^a   Luo, Suhua ^a   Jiang, Yongyuan ^a   Meng, Qingxin ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Defect structure; Optical damage resistance

Indexed keywords

BIREFRINGENCE; CRYSTAL DEFECTS; DEFECT STRUCTURES; INFRARED SPECTROSCOPY;

CZOCHRALSKI TECHNIQUE; DISTORTION METHOD; LINBO3 CRYSTALS; OPTICAL DAMAGE RESISTANCE; PHOTOINDUCED BIREFRINGENCE; TRANSMITTED LIGHT; UV-VISIBLE;

CRYSTAL STRUCTURE;

EID: 77149146208     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.200900620     Document Type: Article

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