High data rate 850 nm oxide VCSEL for 20 Gbit/s application and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7631, Issue , 2009, Pages

  Ji, Chen ^a   Wang, Jingyi ^a   Söderström, David ^a   Giovane, Laura ^a  

^a BROADCOM CORPORATION   (United States)

Author keywords

20gbit s eye diagram; 850 nm oxide VCSEL; Finite element simulation; Small signal modulation response; Vertical cavity surface emitting laser

Indexed keywords

20GBIT/S EYE DIAGRAM; EYE DIAGRAMS; FINITE ELEMENT SIMULATIONS; SMALL-SIGNAL MODULATION RESPONSE; VERTICAL CAVITY SURFACE EMITTING LASER;

CHEMICAL VAPOR DEPOSITION; FINITE ELEMENT METHOD; LASER PULSES; OPTOELECTRONIC DEVICES;

SURFACE EMITTING LASERS;

EID: 77049115726     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.853250     Document Type: Conference Paper

References (4)

1. C. Ji, J. Y. Wang, D. Soderstrom, K. L. Chen, R. Murty, M. Keever, L. Giovane, G. H. Koh, J. K. Hwang, J. Tan, J. Chu, "High volume 850nm oxide VCSEL development for high bandwidth optical data link applications (Invited)," 7229-3, SPIE Photonic West Conference, 2009.
2. R. H. Johnson, D. M. Kuchta, "30Gbit/s directly modulated 850 nm datacom VCSELs," CLEOS postdeadline, CPDB2, 2008.
3. P. Westbergh, J. S. Gustavsson, A. Haglund, M. Skold, A. Joel, A. Larsson, "high speed low current density 850 nm VCSELs," IEEE J. Select. Topics Quantum Electron., 13, pp. 694-702, 2009.
4. B. J. Thibeault, K. Bertilsson, E.R. Hegblom, E. Strzelecka, P. D. Floyd, R. Naone, L.A. Coldren, "high speed characteristics of low optical loss oxide apertured vertical cavity lasers," IEEE Photonics Technol. Lett., vol. 9, pp. 11-13, 1997.