Nanoimprint lithography for optic fluidics with phase gratings for environmental monitoring application

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 824-826

  Yang, Rong ^a   Lu, Bing Rui ^a,b   Xue, Jing ^a   Shen, Zhen Kui ^a   Xu, Zhen Cheng ^a   Huq, Ejaz ^b   Qu, Xin Ping ^a   Chen, Yifang ^b   Liu, Ran ^a  

^a ASIC and System   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Nanoimprint lithography; Optic fluidics; Sensing; SU 8

Indexed keywords

ENVIRONMENTAL MONITORING; HIGH THROUGHPUT; MEDICAL DIAGNOSTICS; MICRO-FLUIDIC DEVICES; OPTIC FLUIDICS; OPTIC-FLUIDIC; OPTICAL ELEMENTS; OPTICAL LENS; PHASE GRATING; POTENTIAL APPLICATIONS; REFRACTION INDEX; SILICON GRATINGS;

CHEMICAL DETECTION; CHEMICAL ELEMENTS; ENVIRONMENTAL ENGINEERING; FLUIDIC DEVICES; FLUIDICS; LIGHT; THROUGHPUT;

NANOIMPRINT LITHOGRAPHY;

EID: 76949094774     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.030     Document Type: Article

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