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Journal of Applied Physics

Volumn 107, Issue 3, 2010, Pages

Study of the Au Schottky contact formation on oxygen plasma treated n -type SnO2 (101) thin films

(5) Nagata, Takahiro a,b Bierwagen, Oliver a White, Mark E a Tsai, Min Ying a Speck, James S a

a University of California (United States)

b NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADLAYERS; ANGLE-RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY; AS-GROWN; AS-GROWN FILMS; BANDBENDING; BULK ELECTRONS; BULK TRAPS; CAPACITANCE VOLTAGE; DAMAGED LAYERS; DIFFERENTIAL HALL MEASUREMENT; ION ENERGIES; OXYGEN ADSORPTION; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; PLASMA TREATMENT; SCHOTTKY CONTACTS; SIGNAL INTENSITIES; SURFACE ACCUMULATION; XPS;

GAS ADSORPTION; ION BOMBARDMENT; IONS; OXYGEN; PLASMA APPLICATIONS; PLASMAS; SURFACE STRUCTURE; THIN FILMS; TIN; TIN DIOXIDE; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

GOLD;

EID: 76949089454 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3298467 Document Type: Article

Times cited : (46)

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