Selective microfabrication of silver electrodes inside a microchannel by multiphase laminar flow with density difference

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1375-1378

  Paek, Seung Ho ^a   Choi, Young Ki ^a   Kim, Dong Sung ^a  

^a Chung Ang University   (South Korea)

Author keywords

Microfluidic device; Multiphase laminar flow; Selective microfabrication; Silver electrode

Indexed keywords

BOTTOM WALL; CHEMICAL DEPOSITION; DENSITY DIFFERENCE; DOUBLE ELECTRODES; ELECTROLESS; FLOW DURATION; METAL ELECTRODES; MICRO-FABRICATION TECHNIQUES; MICRO-FLUIDIC DEVICES; MICROFLUIDIC DEVICE; MULTIPHASE FLUIDS; MULTIPHASE LAMINAR FLOW; SILVER DEPOSITION; SILVER ELECTRODE; SILVER ELECTROLESS PLATING; SINGLE ELECTRODES;

ELECTROCHEMICAL ELECTRODES; ELECTROLESS PLATING; FLUIDIC DEVICES; FLUIDS; LAMINAR FLOW; MICROANALYSIS; MICROFABRICATION; MICROFLUIDICS; MICROMACHINING; MULTIPHASE FLOW; ROTATION; SILVER;

MICROCHANNELS;

EID: 76949084382     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.176     Document Type: Article

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