Enhanced flux pinning in MOCVD-YBCO films through Zr additions: Systematic feasibility studies

Superconductor Science and Technology

Volumn 23, Issue 1, 2010, Pages

  Aytug, T ^a   Paranthaman, M ^a   Specht, E D ^a   Zhang, Y ^a   Kim, K ^a   Zuev, Y L ^a   Cantoni, C ^a   Goyal, A ^a   Christen, D K ^a   Maroni, V A ^b   Chen, Y ^c   Selvamanickam, V ^c  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c SUPERPOWER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

C-AXIS DIRECTION; ENHANCED FLUX PINNING; FEASIBILITY STUDIES; IN-FIELD; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD-YBCO; MOLE PERCENTAGES; NANODOTS; RAMAN MICROSCOPY; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; SELF-ASSEMBLED; SYSTEMATIC EFFECTS; YBCO FILM; ZR ADDITION;

FLUX PINNING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; POINT DEFECTS; POLYMER BLENDS; SUPERCONDUCTING FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; YTTRIUM BARIUM COPPER OXIDES; ZIRCONIUM ALLOYS;

ZIRCONIUM;

EID: 76749127555     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/23/1/014005     Document Type: Article

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