Doped iron oxide thin films for photoelectrochemical generation of hydrogen from water

ECS Transactions

Volumn 25, Issue 8 PART 2, 2009, Pages 1081-1086

  Sheel, D W ^a,b   Lewis, J ^a   Robinson, A ^a   Yates, H M ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b CVD Technologies Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH GROWTH RATE; HIGH STABILITY; IRON OXIDE THIN FILMS; MATERIAL STRUCTURE; OXIDE SEMICONDUCTOR; PHOTO-CATALYTIC; PHOTOELECTROCHEMICAL GENERATION; PHOTORESPONSES; SOLAR IRRADIATION; THERMAL CVD; WATER SPLITTING;

ATMOSPHERIC PRESSURE; CATALYSIS; CATALYSTS; HYDROGEN PRODUCTION; IRON OXIDES; OXIDE FILMS; SEMICONDUCTOR GROWTH; SOLAR POWER GENERATION;

CHEMICAL VAPOR DEPOSITION;

EID: 76549130108     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3207709     Document Type: Conference Paper

References (4)

1. A. Fujishima and K. Honda, Nature, 238, 37 (1972).
2. W. B. Ingler Jr. and S. U. M. Khan, Thin Solid Films, 461, 301 (2004).
3. W. B. Ingler Jr. and S. U. M. Khan, Int. J. Hydrogen Energ. 30, 821 (2005).
4. M G. Nolan, M E. Pemble, D.W. Sheel and H.M. Yates, Thin Solid Films, 515, 1956 (2006).